In semiconductor manufacturing, processes such as sputtering, thin-film deposition, and processes involving reactive gases require strict control of the vacuum environment. In addition to pressure and temperature, monitoring gas composition, residual gases, and H₂O moisture levels plays an important role in maintaining process stability and product quality.
As semiconductor technology continues to advance, the need for higher measurement accuracy and Real-Time Process Monitoring is also increasing.
1. Challenges in Gas and Contamination Control
During the manufacturing process, even small amounts of moisture, residual gases, or contamination inside the chamber can affect process conditions and film quality.
If these abnormalities are not detected in time, manufacturers may face:
- Process instability.
- Variations in film quality.
- Increased risk of contamination.
- Difficulty identifying the root cause of process issues.
- Increased troubleshooting time and downtime.
- Reduced production efficiency and yield.
Therefore, simply checking the chamber after a problem occurs may not be sufficient. The ability to monitor gas composition during the manufacturing process enables engineers to take a more proactive approach to process control.
2. ULVAC’s Solution – Qulee Process Gas Monitor
To address these challenges, ULVAC has developed the Qulee Process Gas Monitor, designed to analyze and monitor gas composition in vacuum-based manufacturing processes.
Qulee CGM2
The Qulee CGM2 is suitable for applications such as Residual Gas Analysis (RGA) and H₂O/moisture monitoring, particularly in sputtering processes.
Key features include:
- Residual Gas Analysis.
- H₂O/moisture monitoring.
- Total Pressure Measurement capability.
- No differential pumping system required for applicable configurations.
Qulee RGM2
The Qulee RGM2 is a compact integrated model designed to provide stable gas analysis even in processes involving complex reactions.
Key features include:
- High-sensitivity gas analysis.
- Compact integrated design.
- Monitoring capabilities for reactive processes.
- Maintenance and data traceability functions.
3. ULVAC Qulee for Process Stability and Production Efficiency
Through Real-Time Process Gas Monitoring, Qulee provides data that helps engineers to:
- Detect abnormal changes in gas composition at an early stage.
- Support troubleshooting and root-cause analysis.
- Monitor chamber and process conditions.
- Improve process stability.
- Help reduce downtime and improve production efficiency.
A Process Gas Monitor does not directly increase yield. However, monitoring data can help manufacturers better control factors that affect process stability and product quality.
With extensive experience in vacuum technology, ULVAC provides comprehensive solutions ranging from vacuum equipment, vacuum pumps, measurement & monitoring to installation, maintenance, and technical support, supporting the diverse requirements of semiconductor and other high-tech manufacturing facilities.
Need to Control Residual Gas, H₂O, or Contamination in Your Vacuum Process?
Contact ULVAC Vietnam for consultation on the Qulee Process Gas Monitor solution tailored to your technical requirements and manufacturing process.
