High-energy Ion Implanter SOPHI-400
SOPHI-400 is a cluster type, high-energy ion implanter applicable to 2400 keV.
Features
- Cluster type
- Thin wafers Compatible.
- Parallel beam
- High energy: 2400 keV
- Wafer size: up to 200mm
applications
- Power device manufacturing process, IGBT
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ULVAC Vietnam Representative Office
29/11/100 Le Duc Tho Street, Ward 7, Go Vap District Ho Chi Minh City, Vietnam
5/5/42 Thanh Binh Street, Hai Duong Province, Vietnam