Ion Implantation System

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SOPHI-30 Series

SOPHI-30, cluster type low-acceleration and high-density ion implanter, has no mass separator and supports thin wafers.

SOPHI-200/260 Series

This tool, SOPHI-200/260, basically inherits exisiting medium current production model ion implanter, and remove over specification based on our sufficient experience as tool supplier. Therefore, thanks to effective cost reduction, we can offer inexpensive sales price with parallel scan capability.

SOPHI-400 Series

SOPHI-400 is a cluster type, high-energy ion implanter applicable to 2400 keV.

IH-860DSIC Series

Ion Implanter for mass production with high temp ESC for SiC.

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