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SOPHI-30, cluster type low-acceleration and high-density ion implanter, has no mass separator and supports thin wafers.
This tool, SOPHI-200/260, basically inherits exisiting medium current production model ion implanter, and remove over specification based on our sufficient experience as tool supplier. Therefore, thanks to effective cost reduction, we can offer inexpensive sales price with parallel scan capability.
SOPHI-400 is a cluster type, high-energy ion implanter applicable to 2400 keV.
29/11/100 Le Duc Tho Street, Ward 7, Go Vap District Ho Chi Minh City, Vietnam
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