Carbon Nanotube Growth Experimenting System CN-CVD-400
ULVAC developed the technique for growing carbon nanotube vertically and selectively on a substrate for the first time in the world. By using the microwave plasma CVD technique, ULVAC has succeeded in mass production of nanotubes with high purity. Drastic improvement of performance can be expected in many fields, including cells and storage of hydrogen.
Features
- Capability of growing nanotube vertically on a substrate
- Capability of growing nanotube directly and selectively only in a specific metal portion on a glass substrate
- Substrate temperature during growth is approx. 600ºC.
specifications
| CN-CVD-400 | ||
| Maximum substrate size | 4 inches in diameter | |
| Footprint | 3.5m × 1.7m × 2.1m (not including maintenance space) | |
| AC power supply | 200V ±10% | |
| Duct tie-in | NW25KF | |
| Attenuating gas | Nitrogen >10 SLM | |
| Process gas tie-in | VCR 6.35mm | |
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ULVAC Vietnam Representative Office
29/11/100 Le Duc Tho Street, Ward 7, Go Vap District Ho Chi Minh City, Vietnam
5/5/42 Thanh Binh Street, Hai Duong Province, Vietnam