ULVAC Vietnam Representative Office

Carbon Nanotube Growth Experimenting System CN-CVD-400

ULVAC developed the technique for growing carbon nanotube vertically and selectively on a substrate for the first time in the world. By using the microwave plasma CVD technique, ULVAC has succeeded in mass production of nanotubes with high purity. Drastic improvement of performance can be expected in many fields, including cells and storage of hydrogen.


  • Capability of growing nanotube vertically on a substrate
  • Capability of growing nanotube directly and selectively only in a specific metal portion on a glass substrate
  • Substrate temperature during growth is approx. 600ºC.


Maximum substrate size4 inches in diameter
Footprint3.5m × 1.7m × 2.1m (not including maintenance space)
AC power supply200V ±10%
Duct tie-inNW25KF
Attenuating gasNitrogen >10 SLM
Process gas tie-inVCR 6.35mm