Low-acceleration and High-density Ion Implanter SOPHI-30

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SOPHI-30, cluster type low-acceleration and high-density ion implanter, has no mass separator and supports thin wafers.

Features

Cluster type
Thin wafer compatible.
No mass separator
* Advantages:
1) High throughput ion implanter with low acceleration and high density
2) Half price as compared to conventional implanter
3) 1/3 the footprint of conventional implanter

applications

Power device manufacturing process, IGBT
Wafer size: Up to 200mm