SOPHI-30, cluster type low-acceleration and high-density ion implanter, has no mass separator and supports thin wafers.
Thin wafer compatible.
No mass separator * Advantages: 1) High throughput ion implanter with low acceleration and high density 2) Half price as compared to conventional implanter 3) 1/3 the footprint of conventional implanter
Power device manufacturing process, IGBT
Wafer size: Up to 200mm
ULVAC Vietnam Representative Office
29/11/100 Le Duc Tho Street, Ward 7, Go Vap District Ho Chi Minh City, Vietnam
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