Load-lock type Plasma-CVD System CC-200/400
CC-200/400 is a compact and easy-to-use system for R&D use and production.
Features
- High-density plasma process on 27.12MHz
- Supports the deposition of SiH4 (SiO2, SiNx, SiON, a-Si ) and TEOS (SiO2).
- Supports the chamber cleaning by CF4+O2 plasma.
- Supports the heater for low-temperature deposition of organic EL.
- Supports various substrate sizes.
- Vacuum box-enabled indirect sequential processing within C-series (Sputter: CS-200, Evaporation: CV-200).
applications
- Power devices
- Compound-related devices of LED, LD and highspeed devices
- Organic EL system for R&D use
- Solar battery system for R&D use
- MEMS
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ULVAC Vietnam Representative Office
29/11/100 Le Duc Tho Street, Ward 7, Go Vap District Ho Chi Minh City, Vietnam
5/5/42 Thanh Binh Street, Hai Duong Province, Vietnam