Etching System
NE-550EX
NE550EX is a multipurpose high-density plasma etching system, especially for test facilities such as universities and government agencies.
NE-5700/NE-7800
Dry etching system for high volume production with good cost performance and wide selection of tool configuration.
Dry etching system with ULVAC original NLD (Neutral Loop Discharge) Plasma Source.
NLD-5700
Production type dry etching system with ULVAC original NLD (Neutral Loop Discharge) Plasma Source.
RISETM-300
Batch type equipment of chemical dry cleaning for remoral of native oxide in Narrow and Deep-contact patterns of advanced semiconductor.
ULHITETMNE-7800H
ULHITETM NE-7800H is the cluster type etching system of low-pressure and high-density plasma for NVM materials(difficult etch materials, used for FeRAM, MRAM, ReRAM, CBRAM, PCRAM etc.),dielectric, noble metals and Magnetic Layers.
Gemini-200,300
Gemini is to equip with a variety of different process modules on the same transfer core which makes reducing spare parts by adopting the same common parts as much as possible as well as improves usability with the same operation panel between these different modules. This improves further efficiency for manufacturing process of advanced electronics.
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ULVAC Vietnam Representative Office
29/11/100 Le Duc Tho Street, Ward 7, Go Vap District Ho Chi Minh City, Vietnam
5/5/42 Thanh Binh Street, Hai Duong Province, Vietnam